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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2535-2541

Optimization of hardness by the control of microwave power in TiN thin film deposited by electron cyclotron resonance assisted sputtering in a nitrogen plasma

(2) Carney, Carl a Durham, Delcie a,b

a UNIVERSITY OF VERMONT (United States)

b NATIONAL SCIENCE FOUNDATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033442836 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.581993 Document Type: Article

Times cited : (3)

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