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Volumn 78, Issue 21, 2001, Pages 3289-3291

Stress-induced leakage current in ultrathin SiO2 layers and the hydrogen dispersive transport model

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[No Author keywords available]

Indexed keywords


EID: 0035926964     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1375003     Document Type: Article
Times cited : (38)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.