Characterization of rhenium-silicon thin films

Fresenius' Journal of Analytical Chemistry

Volumn 358, Issue 1-2, 1997, Pages 325-328

  Thomas, Jürgen ^a   Schumann, Joachim ^a   Pitschke, Wolfram ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000678646     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160050419     Document Type: Article

References (7)

1. Powalla M, Herz K (1993) Appl Surf Sci 70/71: 593
2. Schumann J, Gladun C, Mönch JI, Heinrich A, Thomas J, Pitschke W (1994) Thin Solid Films 246: 24
3. Burkov A T, Heinrich A, Gladun C, Pitschke W, Schumann J (1996) to be published in Proc XV Int Conf on Thermoelectrics, Pasadena CA, March 1996
4. Cliff G, Lorimer GW (1975) J Microscopy 103: 203
5. Klaar H J, Schwaab P (1990) Pract Met 27: 373
6. Zaluzec N J (1979) In: Introduction to analytical electron microscopy. Plenum Press, New York London: 121-167
7. Konnert JH, Karle J (1973) Acta Cryst A29: 702