XPS studies and factor analysis of PbS nanocrystal-doped SiO2 thin films

Journal of Electron Spectroscopy and Related Phenomena

Volumn 104, Issue 1-3, 1999, Pages 161-171

  Reiche, R ^a   Thielsch, R ^b   Oswald, S ^a   Wetzig, K ^a  

^a IFW DRESDEN   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

PbS; SiO2; Small size clusters; Sputtering effects; XPS factor analysis

Indexed keywords

BINDING ENERGY; COMPOSITION EFFECTS; DIELECTRIC FILMS; NANOSTRUCTURED MATERIALS; PLASTIC FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICA; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITE FILMS; ELECTROSTATIC CHARGING; OPTICAL BANDGAP ENERGIES;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 0032591102     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0368-2048(98)00326-0     Document Type: Article

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