High-frequency eddy-current technique for thickness measurement of micron-thick conducting layers

Applied Physics Letters

Volumn 78, Issue 11, 2001, Pages 1634-1636

  Sakran, F ^a   Golosovsky, M ^a   Goldberger, H ^a   Davidov, D ^a   Frenkel, A ^b  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

^b MSI Engineering Software Ltd   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035848082     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1355298     Document Type: Article

References (17)

1. C. Gao and X.-D. Xiang, Rev. Sci. Instrum. 69, 3846 (1998).
2. M. Golosovsky and D. Davidov, Appl. Phys. Lett. 68, 1579 (1996); A. Lann, M. Abu-Teir, M. Golosovsky, D. Davidov, S. Djordjevic, N. Bontemps, and L. F. Cohen, Rev. Sci. Instrum. 70, 4348 (1999).
3. M. Golosovsky and D. Davidov, Appl. Phys. Lett. 68, 1579 (1996); A. Lann, M. Abu-Teir, M. Golosovsky, D. Davidov, S. Djordjevic, N. Bontemps, and L. F. Cohen, Rev. Sci. Instrum. 70, 4348 (1999).
4. D. E. Steinhauer, C. P. Vlahacos, S. Dutta, F. C. Wellstood, and S. M. Anlage, Appl. Phys. Lett. 72, 861 (1998).
5. M. Tabib-Azar, N. Shoemaker, and S. Harris, Meas. Sci. Technol. 3, 583 (1993).
6. J. Blitz, Electrical and Magnetic Methods of Nondestructive Testing (Adam Hilger, Bristol, 1991).
7. J. C. Moulder, E. Uzal, and J. H. Rose, Rev, Sci. Instrum. 63, 3455 (1992).
8. C. C. Tai, J. H. Rose, and J. C. Moulder, Rev. Sci. Instrum. 67, 3965 (1996).
9. K. E. Amin and K. Peck, Mater. Eval. 56, 53 (1998).
10. J. H. Claassen, M. E. Reeves, and R. J. Soulen, Jr., Rev. Sci. Instrum. 62, 996 (1991).
11. K. Wegendt, R. P. Huebener, R. Gross, Th. Trauble, W. Geweke, W. Patzwaldt, W. Prusseit, and H. Kinder, Cryogenics 35, 155 (1995).
12. A. Ptchelintsev and B. de Halleux, Rev. Sci. Instrum. 67, 3688 (1996).
13. R. C. Black, F. C. Wellstood, E. Dantsker, A. H. Miklich, J. J. Kingston, D. T. Nemeth, and J. Clarke, Appl. Phys. Lett. 64, 100 (1994).
14. V. Agrawal, P. Neuzil, and D. W. van der Weide, Appl. Phys. Lett. 71, 2343 (1997).
15. C. V. Dodd and W. E. Deeds, J. Appl. Phys. 39, 2829 (1968).
16. J. Gilchrist and E. H. Brandt, Phys. Rev. B 54, 3530 (1996).
17. B. N. Breen, C. Goldberger, and L. Talalaevsky, Techn. article, AVX Israel Ltd., Har Hozvim P.O.B. 450080, 91450 Jerusalem, Israel.