Deposition of high quality amorphous silicon by a new "Hot Wire" CVD technique

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 85-90

  Morrison, Scott ^a   Coates, Ken ^a   Xi, Jianping ^a   Madan, Arun ^a  

^a MVSystems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEGRADATION; PHOTOCONDUCTIVITY; PHOTOVOLTAIC CELLS; RAMAN SPECTROSCOPY; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR DOPING; X RAY DIFFRACTION;

HOT WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON MATERIALS;

AMORPHOUS SILICON;

EID: 0033300113     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-85     Document Type: Article

References (6)

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6. Plasma Deposition of Amorphous Silicon Based Materials, G. Bruno, P. Capezutto, and A. Madan, eds. Academic Press, 1995.