Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4449, Issue , 2001, Pages 30-40

  Boher, Pierre ^a   Evrard, Patrick ^a   Piel, Jean Philippe ^a   Stehle, Jean Louis ^a  

^a SOPRA   (France)

Author keywords

157nm; Grazing x ray reflectance; Spectroscopic ellipsometry; UV lithography; VUV

Indexed keywords

ANTIREFLECTION COATINGS; DIELECTRIC MATERIALS; ELECTROMAGNETIC WAVE REFLECTION; GATES (TRANSISTOR); MULTILAYERS; PHOTOLITHOGRAPHY; PHOTORESISTS; THICKNESS MEASUREMENT; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAYS;

GATE DIELECTRICS; GRAZING X RAY REFLECTANCE; VISIBLE ULTRAVIOLET SPECTROSCOPIC ELLIPSOMETER;

ELLIPSOMETRY;

EID: 0035761206     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.450107     Document Type: Conference Paper

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