An OPC technology roadmap to 0.14μm design rules

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 382-396

  Chen, J Fung ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Caldwell, Roger ^a   Naderi, Alex ^b   Van Den Broeke, Doug ^b  

^a MicroUnity Systems Engineering Inc   (United States)

^b PHOTRONICS INC   (United States)

Author keywords

Die to database inspection; DOF; OPC; Optical Proximity Correction; Overlapped DOF; Scattering bar; Serif; Sub resolution assist feature

Indexed keywords

DOF; OPC; OPTICAL PROXIMITY CORRECTION; OVERLAPPED DOF; SCATTERING BAR; SERIF; SUB-RESOLUTION ASSIST FEATURE;

APPLICATION SPECIFIC INTEGRATED CIRCUITS; BENCHMARKING; DATA HANDLING; DIES; INDUSTRIAL MANAGEMENT; INSPECTION; MASKS; MICROPROCESSOR CHIPS; OPTICAL INSTRUMENTS; OPTICAL RESOLVING POWER; POLYSILICON; SCATTERING; TECHNOLOGY;

DATABASE SYSTEMS;

EID: 0001050146     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301210     Document Type: Conference Paper

References (6)

1. J. Fung Chen, Tom Laidig, Kurt E. Wampler, Roger Caldwell, "Practical Method for Full-Chip Optical Proximity Correction," SPIE Proceedings, Vol. 3051, 1997.
2. J. Fung Chen, Tom Laidig, Kurt E. Wampler, Roger Caldwell, "Optical Proximity Correction for Intermediate-Pitch Features Using Sub-Resolution Scattering Bars," paper presented in EIPBN 97, manuscript accepted by JVST B, to be published in Nov/Dec 1997.
3. J. Fung Chen, Tom Laidig, Kurt E. Wampler, Roger Caldwell, "Qualification and Application of an OPC Characterization Reticle for Advanced Poly Gate Masks," Advanced Reticle Symposium, June 1997.
4. Miles Gehm, Olga Kobozeva, Roger Caldwell, J. Fung Chen, Tom Laidig, Kurt Wampler, "Practical Method for OPC Rule Determination to Include Corrections for both Photo and Etch Proximity Effects," PROLITH™ User's Group Proceedings, Spring 1997.
5. Roger Caldwell, "A Turn-key OPC Solution," BACUS NEWS, Vol. 13, Issue 6, June 1997.
6. Alexander Tritchkov, John Randall, Jo Finders, Kurt Ronse, and Luc Van den hove, "Proximity Effects Correction for Advanced Optical Lithography Processes," paper presented in EIPBN 97, manuscript accepted by JVST B, to be published in Nov/Dec 1997.