146-nm light induced crosslinking of poly(vinylphenol) and its silylation

Journal of Photopolymer Science and Technology

Volumn 14, Issue 5, 2001, Pages 753-758

  Shirai, Masamitsu ^a   Yazama, Kohshi ^a   Okamura, Haruyuki ^a   Tsunooka, Masahiro ^a   Watanabe, Hiroyuki ^b   Itani, Toshiro ^b  

^a Osaka Prefecture University   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

146 nm light; Photocrosslinking; Poly(vinylphenol); Silylation; TSI process

Indexed keywords

DIMETHYLSILYLDIMETHYLAMINE; NITROGEN; POLY(VINYLPHENOL); POLYSTYRENE; SILANE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BOND; CROSS LINKING; FILM; INFRARED SPECTROSCOPY; IRRADIATION; LIGHT; MOLECULAR WEIGHT; PHOTOLYSIS; SOLUBILIZATION; VAPOR;

EID: 0035747073     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.753     Document Type: Article

References (14)