C-axis-oriented Ru thin films prepared by sputtering in Ar and O2 gas mixture

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 12, 2001, Pages 6956-6958

  Abe, Yoshio ^a   Kaga, Yukinao ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ar+O2 mixed gas; C axis oriented film; Crystal growth; Resistivity; Rocking curve; Ru; Sputtering; X ray diffraction

Indexed keywords

ARGON; CRYSTAL GROWTH; DEPOSITION; MIXTURES; OXYGEN; SPUTTERING; SUBSTRATES; TEMPERATURE; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FULL WIDTH AT HALF MAXIMUM; ROCKING CURVE;

RUTHENIUM;

EID: 0035713242     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.6956     Document Type: Article

References (16)