Highly (200)-oriented Pt films on SiO2/Si substrates by seed selection through amorphization and controlled grain growth

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 634-637

  Kim, Min Hong ^a   Park, Tae Soon ^a   Lee, Dong Su ^a   Yoon, Euijoon ^a   Park, Dong Yeon ^a,b   Woo, Hyun Jung ^a,b   Chun, Dong Il ^b   Ha, Jowoong ^a,b  

^a Seoul National University   (South Korea)

^b Tong Yang Central Laboratories   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; CRYSTAL ORIENTATION; GRAIN GROWTH; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; NUCLEATION; PLATINUM; PRESSURE EFFECTS; SILICA; SILICON; THERMAL EFFECTS;

MICROCRYSTALLITES;

METALLIC FILMS;

EID: 0033097614     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0641     Document Type: Article

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