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Volumn 308-310, Issue , 2001, Pages 808-811
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Incorporation and thermal stability of defects in highly p-conductive non-stoichiometric GaAs: Be
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Author keywords
Be doping; Native point defects; Non stoichiometric GaAs; Thermal stability
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Indexed keywords
ANNEALING;
BERYLLIUM;
CONCENTRATION (PROCESS);
LATTICE CONSTANTS;
MOLECULAR BEAM EPITAXY;
POINT DEFECTS;
SEMICONDUCTOR DOPING;
STOICHIOMETRY;
SUBSTRATES;
THERMODYNAMIC STABILITY;
NATIVE POINT DEFECTS;
SEMICONDUCTING GALLIUM ARSENIDE;
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EID: 0035675010
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-4526(01)00809-2 Document Type: Article |
Times cited : (4)
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References (16)
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