Treatment of organic polymer surfaces by CF4 plasmas: Etching by fluorine atoms and influence of vacuum ultraviolet radiation

Journal of Applied Physics

Volumn 90, Issue 11, 2001, Pages 5491-5496

  Schwarzenbach, W ^a,b   Derouard, J ^a   Sadeghi, N ^a  

^a UNIV GRENOBLE ALPES   (France)

^b PARC TECHNOLOGIQUE DES FONTAINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035575878     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1410892     Document Type: Article

References (46)

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