Mass spectrometric detection of F atoms and CFx, radicals in CF4 plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4644-4647

  Schwarzenbach, Walter ^a   Tserepi, Angeleki ^a   Derouard, Jacques ^a,b   Sadeghi, Nader ^a  

^a UNIV GRENOBLE ALPES   (France)

^b INSTITUT UNIVERSITAIRE DE FRANCE   (France)

Author keywords

Absolute concentration; Appearance mass spectrometry; Fluorine atoms; Gas phase composition; Silicon etching

Indexed keywords

ATOMS; COMPOSITION EFFECTS; DISSOCIATION; ETCHING; FLUOROCARBONS; FREE RADICALS; IONIZATION OF GASES; MASS SPECTROMETRY; PHASE COMPOSITION; SILICON COMPOUNDS;

PLASMA CHAMBERS;

PLASMAS;

EID: 0031176078     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4644     Document Type: Article

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