Surface modification of hexatriacontane by CF4 plasmas studied by optical emission and threshold ionization mass spectrometries

EPJ Applied Physics

Volumn 4, Issue 2, 1998, Pages 181-191

  Poncin Epaillard, F ^a   Wang, W ^a   Ausserre D ^a   Scharzenbaoh, W ^b   Derouard, J ^b   Sadeghi, N ^b  

^a UNIVERSITÉ DU MAINE   (France)

^b LIPHY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; FLUOROCARBONS; GLOW DISCHARGES; HALOGENATION; INTERFACIAL ENERGY; IONIZATION; LIGHT EMISSION; MASS SPECTROMETRY; PARAFFINS; PLASMA APPLICATIONS; SURFACE ROUGHNESS; SURFACE TREATMENT;

HAXATRIACONTANE; OPTICAL EMISSION MASS SPECTROMETRY; TETRAFLUOROMETHANE; THRESHOLD IONIZATION MASS SPECTROMETRY;

HIGH DENSITY POLYETHYLENES;

EID: 0032291660     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998259     Document Type: Article

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