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Materials Research Society Symposium - Proceedings

Volumn 675, Issue , 2001, Pages

Preparation and properties of amorphous carbon oxynitrides a-CNxOy films made by a nitrogen radical sputter method and by the layer-by-layer method

(3) Naruse, Yohko a Nitta, Shoji a Habuchi, Hitoe a

a GIFU NATIONAL COLLEGE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ETCHING; FILM PREPARATION; FREE RADICALS; MAGNETRON SPUTTERING; NITROGEN; OXIDATION; OXYGEN; PARAMAGNETIC RESONANCE; RAMAN SCATTERING; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON OXYNITRIDES FILMS; LAYER BY LAYER METHOD; NITROGEN RADICAL SPUTTER METHOD; OXYGEN RADICAL TREATMENT; PHOTOTHERMAL DEFLECTION SPECTROSCOPY; ULTRAVIOLET VISIBLE OPTICAL TRANSMITTANCE SPECTRA;

CARBON NITRIDE;

EID: 0035560335 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-675-w10.5.1 Document Type: Conference Paper

Times cited : (3)

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