Electromigration in epitaxial copper lines

Materials Research Society Symposium - Proceedings

Volumn 648, Issue , 2001, Pages P11371-P11376

  Goindi, H S ^a   Shin, C S ^a   Frederick, M ^a   Shusterman, Y ^a   Kim, H ^a   Petrov, I ^a   Ramanath, G ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CURRENT DENSITY; ELECTRIC CONDUCTIVITY; ELECTROMIGRATION; EPITAXIAL GROWTH; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; METALLIC FILMS; POLYCRYSTALLINE MATERIALS; X RAY DIFFRACTION ANALYSIS;

DEFECT DENSITY;

COPPER;

EID: 0035559723     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)