SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 664, Issue , 2001, Pages A961-A966

Nanostructured silicon films produced by PECVD

(6) Martins, R a Aguas H a Silva, V a Ferreira, I a Cabrita, A a Fortunato, E a

a Center of Excellence in Microelectronics Optoelectronics and Processes (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; HYDROGEN; ION BOMBARDMENT; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE REACTIONS; SYNTHESIS (CHEMICAL);

HIGH QUALITY FILMS; SURFACE ACTIVATIONS;

AMORPHOUS FILMS;

EID: 0035558270 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: 10.1557/proc-664-a9.6 Document Type: Article

Times cited : (3)

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