Accurate dry etching with fluorinated gas for two-dimensional Si photonic crystal

Materials Research Society Symposium - Proceedings

Volumn 637, Issue , 2001, Pages

  Takahashi, Chiharu ^a   Takahashi, Jun Ichi ^a   Notomi, Masaya ^a   Yokohama, Itaru ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; DRY ETCHING; ELECTRONIC EQUIPMENT; ENERGY GAP; GASES; SINGLE CRYSTALS; THERMAL EFFECTS;

PHOTONIC CRYSTALS;

SEMICONDUCTING SILICON;

EID: 0035557485     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)