Chemical vapor deposition of titania/silica and zirconia films

Materials Research Society Symposium - Proceedings

Volumn 670, Issue , 2001, Pages K411-K4110

  Gladfelter, Wayne L ^a   Smith, Ryan C ^a   Burleson, David ^a   Taylor, Charles J ^a   Roberts, Jeffrey T ^a   Campbell, Stephen A ^a   Hoilien, Noel ^a   Tiner, Mike ^a   Hegde, Rama ^a   Hobbs, Christopher ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELLIPSOMETRY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAYS;

ZIRCONIA FILMS;

ZIRCONIA;

EID: 0035557331     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-670-k4.1     Document Type: Article

References (26)

1. 2 sol-gel films as a function of composition and heat-treatment
2. Deposition of thick silica-titania sol-gel films on Si substrates
3. 2 glasses by X-ray photoelectron spectroscopy
4. 2
5. Structure and properties of silicon titanium oxide films prepared by plasma-enhanced chemical vapor deposition method
6. Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating
7. Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide
8. Metal alkoxides as precursors for electronic and ceramic materials
9. Chemical vapor deposition of cubic-zirconia thin films from zirconium alkoxide complexes
10. ZrO2 film growth by chemical vapor deposition using zirconium tetra-tert-butoxide
11. The deposition of silicon dioxide films at reduced pressure
12. Properties of silicon dioxide films prepared by low-pressure chemical vapor deposition from tetraethylorthosilicate
13. 2 overlayers on oxide substrates by chemical vapor deposition of Si(OC2H5)4
14. Thin high-dielectric TiO2 films prepared by low pressure MOCVD
15. Structural properties of titanium dioxide films grown on p-Si by metal-organic chemical vapor deposition at low temperature
16. Structural and electrical characterization of TiO2 grown from titanium tetrakis-isopropoxide (TTIP) and TTIP/H2O ambients
17. Does chemistry really matter in the chemical vapor deposition of titanium dioxide? Precursor and kinetic effects on the microstructure of polycrystalline films
18. Thermodynamic stability of binary oxides in contact with silicon
19. A phase diagram for the system Ti-TiO2 constructed from data in the literature
20. 2
21. Anhydrous metal nitrates
22. Titania-silica materials from the molecular precursor Ti
23. Low temperature chemical vapor deposition of ZrO2 on Si(100) using anhydrous zirconium(IV) nitrate
24. Remote plasma enhanced-metal organic chemical vapor deposition of zirconium oxide/silicon oxide alloy, (ZrO2)x-(SiO2)1-x (x. ltoreq. 0.5), thin films for advanced high-K gate dielectrics