Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1173-1179

  Datskos, P G ^a,b   Rajic, S ^a   Sepaniak, M J ^b   Lavrik, N ^b   Tipple, C A ^b   Senesac, L R ^b   Datskou, I ^c  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c Nova Tech EEG Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; ADSORPTION; CHEMICAL SENSORS; ELASTIC MODULI; ISOMERS; MICROSTRUCTURE; MOLECULES; NATURAL FREQUENCIES; PHOTONS; POISSON RATIO; STRESSES; THERMAL EXPANSION;

CHEMICAL COATINGS; CHEMICAL DETECTION; CHEMICAL SELECTIVITY; CHEMICAL STIMULI; DIISOPROPYL METHYL PHOSPHONATE; DIMETHYNAPHTHALENE; MICROCANTILEVERS; TETRACHLOROETHYLENE; TRICHLOROETHYLENE; TRINITROTOLUENE;

MICROELECTROMECHANICAL DEVICES;

EID: 0035535243     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1387082     Document Type: Conference Paper

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