Characterization of an oxygen plasma by using a Langmuir probe in an inductively coupled plasma

Journal of the Korean Physical Society

Volumn 38, Issue 3, 2001, Pages 259-263

  Kim, Jong Sik ^a   Kim, Gon Ho ^a   Chung, Tae Hun ^b   Yeom, Geun Young ^c   Kwon, Kwang Ho ^d  

^a Hanyang University   (South Korea)

^b Dong A University   (South Korea)

^c Sungkyunkwan University   (South Korea)

^d Hanseo University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035532417     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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