Asymmetric plasma potential fluctuation in an inductive plasma source

Plasma Sources Science and Technology

Volumn 9, Issue 1, 2000, Pages 5-11

  Lho, T ^a   Hershkowitz, N ^a   Kim, G H ^a,b   Steer, W ^a   Miller, J ^a,c  

^a University of Wisconsin Madison   (United States)

^b Hanyang University   (South Korea)

^c Ball Semiconductor Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTROSTATICS; PLASMA PROBES;

INDUCTIVE PLASMA SOURCES; PLASMA POTENTIAL;

PLASMA SOURCES;

EID: 0033874649     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/1/302     Document Type: Article

References (14)

1. Hopwood J, Guarnieri C R, Whitehair S J and Cuomo J J 1993 J. Vac. Sci. Technol. 11 152
2. Kortshagen U and Zethoff M 1995 Plasma Sources Sci. Technol. 4 541
3. Eckert H U 1974 High Temp. Sci. 6 99
4. Suzuki K, Nakamura K, Ohkubo H and Sugai H 1998 Plasma Sources Sci. Technol. 7 13
5. Lho T, Hershkowitz N, Miller J, Steer W and Kim G H 1998 Phys. Plasmas 5 3135
6. Hershkowitz N 1989 How a Langmuir probe works Plasma Diagnostics vol 1, ed O Auciello and D L Flamm (New York: Academic)
7. Kemp R F and Sellen J M 1966 Rev. Sci. Instrum. 37 455
8. Langmuir I 1929 Phys. Rev. 33 954
9. Smith J R, Hershkowitz N and Coakley P 1979 Rev. Sci. Instrum. 50 210
10. Cho M H, Chan C, Hershkowitz N and Intrator T 1984 Rev. Sci. Instrum. 55 631
11. Wang E Y, Hershkowitz N, Intrator T and Forest C 1986 Rev. Sci. Instrum. 57 2425
12. Garscadden A and Emeleus K G 1962 Proc. Phys. Soc. 79 535
13. Braithwaite N St J, Crosby A J and Allen J E 1985 8th Int. Conf. on Gas Discharges and their Applications (Leeds: Leeds University Press) p 482
14. Hemenway C L, Henry R W and Caulton M 1962 Physical Electronics (New York: Wiley) ch 6