Comparative evaluation of electron-beam sensitive single layer top surface imaging and bilayer chemical amplification of resist lines process for stencil mask making

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3122-3126

  Elian, K ^a   Irmscher, M ^b   Butschke, J ^b   Letzkus, F ^b   Reuter, C ^b   Springer, R ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273249     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590965     Document Type: Article

References (7)

1. F. Letzkus et al., Mask Technology for Integrated Circuits and Micro-Components 98, Munich, 16-17 November.
2. A. Ehrmann et al., The 43rd International EIPBN Conference, 1-4 June 1999, Marco Island, FL.
3. S. Hien, G. Czech, W.-D. Domke, H. Raske, M. Sebald, and I. Stiebert, Proc. SPIE 1998, 3333 (1998).
4. M. Irmscher, B. Hoefflinger, C. Reuter, R. Springer, C. Stauffer, and M. Puttock, J. Vac. Sci. Technol. B 15, 2605 (1997).
5. D. C. La Tulipe, J. P. Simons, D. E. Seeger, and L. L. Linehan, Proc. SPIE 2195, 372 (1994).
6. R. Franzen, A. Grassmann, M. Kirschinger, T. Schedel, H. Wiedenhofer, and M. Witte, Proc. SPIE 3333 (1998).
7. A. M. Goethals, F. Van Roey, T. Sugihara, L. Van den Hove, J. Vertommen, and W. Klippert, J. Vac. Sci. Technol. B 16, 3322 (1998).