Monte Carlo simulation of charging effects in linewidth metrology (II): On insulator substrate

Scanning

Volumn 20, Issue 8, 1998, Pages 549-555

  Ko, Yeong Uk ^a   Chung, Myung Sae ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Charging effects; Insulator; Linewidth measurement; Monte Carlo simulation; Scanning electron microscopes; Secondary electrons

Indexed keywords

POLY(METHYL METHACRYLATE);

ALGORITHM; ARTICLE; ELECTRON; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SIMULATION; SYSTEM ANALYSIS;

EID: 0032424277     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.4950200803     Document Type: Article

References (8)

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