Large-scale fabrication of hard superlattice thin films by combined steered arc evaporation and unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 93, Issue 1, 1997, Pages 69-87

  Donohue, L A ^a   Munz W D ^a   Lewis, D B ^a   Cawley, J ^a   Hurkmans, T ^b   Trinh, T ^b   Petrov, I ^c   Greene, J E ^c  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b Hauzer Techno Coating BV   (Netherlands)

^c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; EVAPORATION; HARDNESS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SUBSTRATES; SUPERLATTICES; THIN FILMS; TITANIUM NITRIDE;

STEERED ARC EVAPORATION;

CERAMIC COATINGS;

COATING; EVAPORATION; HARDNESS;

EID: 0031204339     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00028-5     Document Type: Article

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