Preparation of lead zirconate titanate thick films by arc-discharged reactive ion-plating method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 9 B, 2001, Pages 5518-5522

  Yasuda, Yoshiaki ^a   Akamatsu, Masahiro ^a   Tani, Masanao ^a   Yoshida, Makoto ^a   Kondo, Ken Ichi ^a   Iijima, Takashi ^b  

^a STANLEY ELECTRIC CO LTD   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Arc discharge; Ferroelectric properties; Ion plating; Orientation; Piezoelectricity; PZT; Thick films

Indexed keywords

CERAMIC MATERIALS; COERCIVE FORCE; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC DISCHARGES; FILM PREPARATION; HEAT TREATMENT; MAGNETIC FIELD EFFECTS; MAGNETIC HYSTERESIS; PERMITTIVITY; PLASMA DENSITY; REMANENCE; SEMICONDUCTING LEAD COMPOUNDS;

ARC-DISCHARGED REACTIVE ION PLATING (ADRIP); CHEMICAL SOLUTION DEPOSITION (CSD); LEAD ZIRCONATE TITANATE (PZT) FILMS;

THICK FILMS;

EID: 0035455017     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5518     Document Type: Article

References (20)