Imprint with sharp tip stamps

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 389-396

  Borzenko, T ^a   Tormen, M ^a   Hock, V ^a   Liu, J ^a   Schmidt, G ^a   Molenkamp, L W ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

Imprint; Nanostructures; Point contacts

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ELECTRON TRANSPORT PROPERTIES; FABRICATION; POINT CONTACTS; SCANNING ELECTRON MICROSCOPY;

METALLIC POINT CONTACTS;

NANOSTRUCTURED MATERIALS;

EID: 0035450401     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00445-2     Document Type: Conference Paper

References (10)

1. Nanoimprint lithography
2. A new fabrication process for metallic point contacts
3. Fabrication of metallic point contacts: A new approach for devices with a multilayer or a heterointerface
4. Imprint lithography with 25-nm resolution
5. Imprint of sub-25 nm vias and trenches in polymers
6. Nanoscale silicon field effect transistors fabricated using imprint lithography
7. 2 storage density fabricated using nanoimprint lithography and read with proximal probe
8. Fabrication of quantum point contacts by imprint lithography and transport studies