Negative (meth)acrylate resist materials based on novel crosslinking chemistry

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 539-545

  Diakoumakos, C D ^a   Raptis, I ^a   Tserepi, A ^a   Argitis, P ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

193 nm optical lithography; 2 hydroxyethyl methacrylate; Acrylate copolymers; Acrylates; Deep UV resist; E beam lithography; Etch resistance; Negative resist

Indexed keywords

CROSSLINKING; ELECTRON BEAM LITHOGRAPHY; ETCHING; IMAGE ANALYSIS; IMAGING TECHNIQUES; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL);

ETCH RESISTANCE;

COPOLYMERS;

EID: 0035450060     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00545-7     Document Type: Conference Paper

References (8)