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Physica Status Solidi (A) Applied Research

Volumn 172, Issue 2, 1999, Pages 373-378

Effect of substrate temperature on the structure and hardness of magnetron sputtering deposited carbon nitride films

(4) Zheng, W T a Guo, J H b Sjostrom H c Sundgren, J E c

a JILIN UNIVERSITY (China)

b UPPSALA UNIVERSITY (Sweden)

c LINKÖPING UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; HARDNESS; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; SILICON WAFERS; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); THERMAL EFFECTS; X RAY ANALYSIS;

CARBON NITRIDE; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE (NEXAFS) ANALYSIS;

PROTECTIVE COATINGS;

EID: 0032658823 PISSN: 00318965 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-396X(199904)172:2<373::AID-PSSA373>3.0.CO;2-L Document Type: Article

Times cited : (4)

References (14)

1
- 0342945364
- H. SJÖSTRÖM, H. STAFSTROM, M. BOMAN, and J.-E. SUNDGREN, Phys. Rev. Lett. 75, 1336 (1995).
- (1995) Phys. Rev. Lett. , vol.75 , pp. 1336
- Sjöström, H.¹ Stafstrom, H.² Boman, M.³ Sundgren, J.-E.⁴

2
- 0030538517
- H. SJÖSTRÖM, L. HULTMAN, J.-E. SUNDGREN, S. V. HAINSWORTH, T. F. PAGE, and G. S. A. M. THEUNISSEN, J. Vacuum Sci. Technol. A 14, 56 (1996).
- (1996) J. Vacuum Sci. Technol. A , vol.14 , pp. 56
- Sjöström, H.¹ Hultman, L.² Sundgren, J.-E.³ Hainsworth, S.V.⁴ Page, T.F.⁵ Theunissen, G.S.A.M.⁶

3
- 0030487320
- W. T. ZHENG, H. SJÖSTRÖM, I. IVANOV, K. Z. XING, E. BROITMAN, W. R. SALANECK, J. GREEN, and J.-E. SUNDGREN, J. Vacuum Sci. Technol. A 14, 2696 (1996).
- (1996) J. Vacuum Sci. Technol. A , vol.14 , pp. 2696
- Zheng, W.T.¹ Sjöström, H.² Ivanov, I.³ Xing, K.Z.⁴ Broitman, E.⁵ Salaneck, W.R.⁶ Green, J.⁷ Sundgren, J.-E.⁸

4
- 0001338769
- B. BHUSHAN, B. K. GUPTA, and M. H. AZARIAN, Wear 181, 734 (1995).
- (1995) Wear , vol.181 , pp. 734
- Bhushan, B.¹ Gupta, B.K.² Azarian, M.H.³

5
- 20444373328
- A. M. LIU and M. L. COHEN, Science 245, 841 (1989).
- (1989) Science , vol.245 , pp. 841
- Liu, A.M.¹ Cohen, M.L.²

6
- 21544441689
- D. LI, Y. W. CHUNG, M. S. WONG, and W. D. SPROUL, J. Appl. Phys. 74, 219 (1993).
- (1993) J. Appl. Phys. , vol.74 , pp. 219
- Li, D.¹ Chung, Y.W.² Wong, M.S.³ Sproul, W.D.⁴

7
- 0027559580
- T. A. YEH, C. L. LIN, J. M. SIVERSTEN, and J. H. JUDY, J. Magn. Mater. 120, 314 (1993).
- (1993) J. Magn. Mater. , vol.120 , pp. 314
- Yeh, T.A.¹ Lin, C.L.² Siversten, J.M.³ Judy, J.H.⁴

8
- 0027628625
- M. Y. CHEN, X. LIN, V. P. DAVID, Y. W. CHUNG, M. S. WONG, and W. D. SPROUL, Tribo. Trans. 36, 491 (1993).
- (1993) Tribo. Trans. , vol.36 , pp. 491
- Chen, M.Y.¹ Lin, X.² David, V.P.³ Chung, Y.W.⁴ Wong, M.S.⁵ Sproul, W.D.⁶

9
- 0000530026
- G. COMELLI, J. STOHR, C. J. ROBINSON, and W. JARK, Phys. Rev. B 38, 7511 (1988).
- (1988) Phys. Rev. B , vol.38 , pp. 7511
- Comelli, G.¹ Stohr, J.² Robinson, C.J.³ Jark, W.⁴

10
- 0001138012
- M. JAOUEN, G. TOURILLON, J. DELAFOND, N. JUNQUA, and G. HUG, Diamond Relat. Mater. 4, 200 (1995).
- (1995) Diamond Relat. Mater. , vol.4 , pp. 200
- Jaouen, M.¹ Tourillon, G.² Delafond, J.³ Junqua, N.⁴ Hug, G.⁵

11
- 0004237782
- Springer, New York
- J. STOHR, NEXAFS Spectroscopy, Springer, New York 1992.
- (1992) NEXAFS Spectroscopy
- Stohr, J.¹

12
- 0002924710
- W. T. ZHENG, K. Z. XING, N. HELLGREN, M. LOGDLUND, A. JOHANSSON, U. GELIUS, W. R. SALANECK, and J.-E. SUNDGREN, J. Electron Spectroscopy Relat. Phenom. 87, 45 (1997).
- (1997) J. Electron Spectroscopy Relat. Phenom. , vol.87 , pp. 45
- Zheng, W.T.¹ Xing, K.Z.² Hellgren, N.³ Logdlund, M.⁴ Johansson, A.⁵ Gelius, U.⁶ Salaneck, W.R.⁷ Sundgren, J.-E.⁸

13
- 0005638529
- D. G. MCCULLOCH and A. R. MERCHANT, Thin Solid Films 290/291, 99 (1996).
- (1996) Thin Solid Films , vol.290-291 , pp. 99
- McCulloch, D.G.¹ Merchant, A.R.²

14
- 9344262786
- M. A. TAMOR and C. H. WU, J. Appl. Phys. 67, 1007 (1990).
- (1990) J. Appl. Phys. , vol.67 , pp. 1007
- Tamor, M.A.¹ Wu, C.H.²

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