Chemical and thermal stability of titanium disilicide contacts on silicon

Journal of Applied Physics

Volumn 90, Issue 3, 2001, Pages 1655-1659

  Hul'ko, O V ^a   Boukherroub, R ^a   Lopinski, G P ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035423506     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1383264     Document Type: Article

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