The role of nickel in Si(001) roughening

Surface Science

Volumn 346, Issue 1-3, 1996, Pages 31-39

  Ukraintsev, V A ^a   Yates Jr , John T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

Auger electron spectroscopy; Low energy electron diffraction; Nickel; Scanning tunneling microscopy; Silicon; Surface detects; Surface roughening

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CONCENTRATION (PROCESS); CRYSTAL ATOMIC STRUCTURE; IMPURITIES; LOW ENERGY ELECTRON DIFFRACTION; NICKEL; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE ROUGHNESS;

MACROSCOPIC ROUGHENING; MEDIUM ENERGY ION SCATTERING; SURFACE CONTAMINATION; SURFACE DETECTS; X RAY PHOTON SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 0030081621     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)00779-2     Document Type: Article

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