Secondary electron enhanced discharges in plasma source ion implantation

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 5945-5955

  Cluggish, B P ^a,b   Munson, C P ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b Archimedes Technology Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001084972     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368889     Document Type: Article

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