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Volumn 90, Issue 1, 2001, Pages 443-448

Electrical characterization of an operating Si pn-junction diode with scanning capacitance microscopy and Kelvin probe force microscopy

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0035396374     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1375803     Document Type: Article
Times cited : (42)

References (17)
  • 12
    • 0348122294 scopus 로고    scopus 로고
    • The fabrication process is based on the standard technology of a 1.5 micron gate length metal-oxide-silicon field-effect transistor, in the Inter-University Semiconductor Research Center, Seoul National University
    • The fabrication process is based on the standard technology of a 1.5 micron gate length metal-oxide-silicon field-effect transistor, in the Inter-University Semiconductor Research Center, Seoul National University.
  • 16
    • 0347492158 scopus 로고    scopus 로고
    • Computer code TSUPREM-4 and MEDICI (Technology Modeling Associates, Inc. 595, Lawrence Expressway, Sunnyvale, CA 94086-3922, versions 6 and 2.1)
    • Computer code TSUPREM-4 and MEDICI (Technology Modeling Associates, Inc. 595, Lawrence Expressway, Sunnyvale, CA 94086-3922, versions 6 and 2.1).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.