Optical emission spectroscopy of RF and microwave plasmas used for chemical vapor deposition in the Si-C-H-Ar system;Etude par spectroscopie d'emission optique de decharges radiofrequence et micro-onde lors du depôt chimique en phase vapeur (PACVD) dans le systeme Si-C-H-Ar

Annales de Chimie: Science des Materiaux

Volumn 23, Issue 5-6, 1998, Pages 743-752

  Andrieux, M ^a   Badie, J M ^b   Ducarroir, M ^a   Thomas, L ^a  

^a UNIVERSITÉ DE PERPIGNAN   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003568160     PISSN: 01519107     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0151-9107(99)80021-x     Document Type: Article

References (22)

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