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Materials Science and Engineering B

Volumn 39, Issue 3, 1996, Pages 188-194

Effect of hydrogen dilution on the deposition of carbon-rich a-SiC:H films by the electron cyclotron resonance method

(4) Liu, Y J a Yoon, S F a Ahn, J a Milne, W I b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

Chemical vapour deposition; Electron cyclotron resonance; Silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; HYDROGENATION; LIGHT ABSORPTION; PHOTOLUMINESCENCE; SILICON CARBIDE;

DEPOSITION RATE; ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION; HYDROGEN DILUTION; HYDROGENATED AMORPHOUS SILICON CARBIDE; INFRARED ABSORPTION; OPTICAL BAND GAP;

AMORPHOUS FILMS;

EID: 0000120189 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/0921-5107(96)01562-0 Document Type: Article

Times cited : (13)

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