SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 4, Issue 4, 2001, Pages

Plasma treatments of molecularly templated nanoporous silica films

(5) Cho, A T a Tsai, T G b Yang, C M a Chao, K J a Pan, F M b

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; FILM GROWTH; HYDROGEN; HYDROPHILICITY; LEAKAGE CURRENTS; NANOSTRUCTURED MATERIALS; OXYGEN; PERMITTIVITY; PLASMA APPLICATIONS; POROSITY; SILANES; SURFACE ROUGHNESS;

HEXAMETHYLDISILAZANE; HYDROPHILIC FILM; NANOPOROUS SILICA FILMS; ORGANIC TEMPLATE; OXYGEN PLASMA TREATMENT;

SILICA;

EID: 0035323480 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1354698 Document Type: Article

Times cited : (15)

References (16)

1
- 0000332148
- (1995) J. Non-Cryst. Solids , vol.190 , pp. 264
- Prakash, S.S.¹ Brinker, C.J.² Hurd, A.J.³

2
- 0029408019
- (1995) Mater. Chem. Phys. , vol.42 , pp. 91
- Cho, C.C.¹ Smith, D.M.² Anderson, J.³

3
- 0031340787
- (1997) J. Non-Cryst. Solids , vol.221 , pp. 151
- Yang, H.-S.¹ Choi, S.-Y.² Hyun, S.-H.³ Park, H.-H.⁴ Hong, J.-K.⁵

4
- 0343494496
- (1997) J. Appl. Phys. , vol.82 , pp. 1299
- Jo, M.H.¹ Park, H.H.² Kim, J.J.³ Hyun, S.H.⁴ Choi, S.Y.⁵ Paik, H.T.⁶

5
- 0000717932
- (1996) Nature (London) , vol.379 , pp. 703
- Yang, H.¹ Kuperman, A.² Coombs, N.³ Mamiche-Afara, S.⁴ Ozin, G.A.⁵

6
- 9444252986
- (1996) Science , vol.273 , pp. 892
- Aksay, I.A.¹ Trau, M.² Manne, S.³ Honma, I.⁴ Yao, N.⁵ Fenter, P.⁶ Eisenberger, P.M.⁷ Gruner, S.M.⁸

7
- 0010325898
- (1999) U.S. Pat. 5,922,299
- Bruinsma, P.J.¹ Bontha, J.R.² Liu, J.³ Baskaran, S.⁴

8
- 0033886937
- (2000) Adv. Mater. , vol.12 , pp. 291
- Baskaran, S.¹ Liu, J.² Domansky, K.³ Kohler, N.⁴ Li, X.⁵ Coyle, C.⁶ Fryxell, G.E.⁷ Thevuthasan, S.⁸ Williford, R.E.⁹

9
- 0030881278
- (1997) Nature (London) , vol.389 , pp. 364
- Lu, Y.¹ Ganguli, R.² Drewien, C.A.³ Anderson, M.T.⁴ Brinker, C.J.⁵ Gong, W.⁶ Guo, Y.⁷ Soyez, H.⁸ Dunn, B.⁹ Huang, M.H.¹⁰ Zink, J.I.¹¹

10
- 0032208977
- (1998) Adv. Mater. , vol.10 , pp. 1380
- Chao, D.¹ Yang, P.² Melosh, N.³ Feng, J.⁴ Chmelka, B.F.⁵ Stucky, G.D.⁶

11
- 0031801728
- (1998) J. Am. Chem. Soc. , vol.120 , pp. 6024
- Zhao, D.¹ Huo, Q.² Feng, J.³ Chmelka, B.F.⁴ Stucky, G.D.⁵

12
- 0010376863
- (1996) U.S. Pat. 5,504,042
- Cho, C.C.¹ Gnade, B.E.² Smith, D.M.³

13
- 0000345105
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 205
- Nitta, S.V.¹ Pisupatti, V.² Jain, A.³ Wayner P.C., Jr.⁴ Gill, W.N.⁵ Plawsky, J.L.⁶

14
- 0033534063
- (1999) Chem. Commun. (Cambridge) , pp. 2373
- Antochshuk, V.¹ Jaroniec, M.²

15
- 0010371191
- (2000) U.S. Pat. 6,042,994
- Yang, J.¹ Drage, J.S.² Forester, L.³

16
- 0003610719
- John Wiley & Sons, New York
- (1982) MOS (Metal Oxide Semiconductor) Physics and Technology , pp. 532
- Nicollian, E.H.¹ Brews, J.R.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.