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Volumn 41, Issue 4, 2001, Pages 511-515

Investigation of stress in shallow trench isolation using UV micro-Raman spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

CRACK PROPAGATION; DENSIFICATION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; STRESS ANALYSIS; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY;

EID: 0035310657     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(00)00260-2     Document Type: Article
Times cited : (13)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.