![]() |
Volumn 41, Issue 4, 2001, Pages 511-515
|
Investigation of stress in shallow trench isolation using UV micro-Raman spectroscopy
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRACK PROPAGATION;
DENSIFICATION;
RAMAN SPECTROSCOPY;
SEMICONDUCTING SILICON;
STRESS ANALYSIS;
SUBSTRATES;
ULTRAVIOLET SPECTROSCOPY;
MECHANICAL STRESS;
MICRO-RAMAN SPECTROSCOPY;
MICROELECTRONICS;
|
EID: 0035310657
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/S0026-2714(00)00260-2 Document Type: Article |
Times cited : (13)
|
References (7)
|