Improved baking of photomasks by a dynamically zone-controlled process approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 356-363

  Dress, P ^a   Gairing, T ^a   Saule, W ^a   Dietze, U ^b   Szekeresch, J ^a  

^a STEAG AG   (Germany)

^b Steag HamaTech USA Inc   (United States)

Author keywords

CAR; Chemically amplified resist; Hotplate; Photomask; Post exposure bake

Indexed keywords

COOLING; HEAT STORAGE; HEAT TRANSFER; OPTIMIZATION; SURFACES; TEMPERATURE;

CHEMICALLY AMPLIFIED RESISTS; PHOTOMASKS; POST COAT BAKE; POST EXPOSURE BAKE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035190747     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438353     Document Type: Article

References (6)

1. Performance of positive tone chemically amplified resists for next generation photomask fabrication
2. Chemically amplified positive resist for the next generation photomask fabrication
3. Resist heating effect on 50kV EB mask writing
4. Performance of chemically amplified positive resists for next generation photomask fabrication
5. CAR blanks feasibility study results
6. Improvement of temperature uniformity during pre-bake process in mask blank manufacturing