Resist heating effect on 50 keV EB mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 126-136

  Sakurai, Hideaki ^a   Abe, Takayuki ^a   Itoh, Masamitsu ^a   Kumagae, Akitoshi ^a   Anze, Hirohito ^a   Higashikawa, Iwao ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; ELECTRON BEAMS; ERROR ANALYSIS; HEATING; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

CHEMICALLY AMPLIFIED RESISTS (CAR); CRITICAL DIMENSION (CD) ERRORS; ELECTRON BEAM WRITING; PHOTOMASKS; RALF'S MODEL;

MASKS;

EID: 0032685595     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360210     Document Type: Conference Paper

References (5)