Performance of positive tone chemically amplified resists for next generation photo mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 82-93

  Segawa, Toshikazu ^a   Kurihara, Masa Aki ^a   Sasaki, Shiho ^a   Inomata, Hiroyuki ^a   Hayashi, Naoya ^a   Sano, Hisatake ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Air borne contaminant; Ammonia; Chemically amplified resist; E beam resist; Post coating delay stability; Post exposure bake; Post exposure delay stability; Prebake

Indexed keywords

AMMONIA; FABRICATION; IMPURITIES; OPTICAL INSTRUMENTS; PHOTOMASKS; PHOTORESISTORS; PHOTORESISTS;

CHEMICALLY AMPLIFIED RESIST; E-BEAM RESIST; POST COATING DELAY STABILITY; POST EXPOSURE BAKE; POST EXPOSURE DELAY STABILITY; PREBAKE;

CHEMICAL STABILITY;

EID: 0002329937     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301231     Document Type: Conference Paper

References (6)

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