Chemically amplified positive resist for the next generation photomask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 577-586

  Katoh, Kohji ^a   Kasuya, Kei ^a   Arai, Tadashi ^a   Sakamizu, Toshio ^a   Satoh, Hidetoshi ^a   Saitoh, Hidetaka ^a   Hoga, Morihisa ^a  

^a Showa Denko Materials Co   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DISSOLUTION; MASKS; PROTECTIVE COATINGS;

CHEMICALLY AMPLIFIED POSITIVE RESISTS; MASK-WRITING SYSTEMS; NOVOLAK-BASED RESISTS;

PHOTORESISTS;

EID: 0033326824     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373354     Document Type: Conference Paper

References (14)