Deposition of polycrystalline AlN thin films by coherent magnetron sputtering at temperatures <80 °C

Journal of Electronic Materials

Volumn 30, Issue 1, 2001, Pages 1-5

  Chu, A K ^c   Chao, C H ^a   Lee, F Z ^a   Huang, H L ^b  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b DEPARTMENT OF PHYSICS   (Taiwan)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING ALUMINUM COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

ALUMINUM NITRIDES; COHERENT SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0035157256     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-001-0206-9     Document Type: Article

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