Solid phase reaction of Ti with Si-Ge layers prepared by Ge-implantation

Journal of Electronic Materials

Volumn 30, Issue 1, 2001, Pages 17-22

  Umapathi, B ^a   Das, S ^a   Lahiri, S K ^a   Kal, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; ION IMPLANTATION; NUCLEATION; PHASE TRANSITIONS; SILICON ALLOYS; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

GERMANOSILICIDATION; SOLID PHASE REACTIONS;

TITANIUM COMPOUNDS;

EID: 0035148201     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-001-0209-6     Document Type: Article

References (31)

1. P.W. Li, E.S. Yang, Y.F. Yang, J.O. Chu, and B.S. Meyerson, IEEE Electron Dev. Lett. EDL-15, 402 (1994).
2. S.S. Iyer, G.L. Patton, J.M.C. Stork, B.S. Meyerson, and D.L. Harame, IEEE Trans. Electron Dev. ED-36, 2043 (1989).
3. R. People, IEEE J. Quantum Electron. QE-22, 1696 (1986).
4. W.C. Lee, Y.C. King, T.J. King, and C. Hu, IEEE Electron Dev. Lett. EDL-19, 247 (1998).
5. T.J. King and K.C. Saraswat, IEEE Trans. Electron Dev. ED-41, 1581 (1994).
6. D.B. Aldrich, Y.L. Chen, D.E. Sayers, R.J. Nemanich, S.P. Ashburn, and M.C. Ozturk, J. Mater. Res. 10, 2849 (1995).
7. O. Thomas, F.M. d'Heurle, and S. Delage, J. Mater. Res. 5, 1453 (1990).
8. D.B. Aldrich, Y.L. Chen, D.E. Sayers, and R.J. Nemanich, Silicides, Germanides, and Their Interfaces, vol. 320, ed. R.W. Fathauer, S. Mantl, L.J. Schowalter, and K.N. Tu (Pittsburgh, PA: MRS, 1994), p. 305.
9. N. Boutarek and R. Madar, Appl. Surface Sci. 73, 209 (1993).
10. D.B. Aldrich, Y.L. Chen, D.E. Sayers, R.J. Nemanich, S.P. Ashburn, and M.C. Ozturk, J. Appl. Phys. 77, 5107 (1995).
11. H. Jeon, G. Yoon, and R.J. Nemanich, Thin Solid Films 299, 178 (1997).
12. J. Lasky, J. Nakos, O. Cain, and P. Geiss, IEEE Trans. Electron Dev. ED-38, 262 (1991).
13. G.L. Miles, R.W. Mann, and J.E. Bertsch, Thin Solid Films 290-291, 469 (1996).
14. I. Sakai, H. Abiko, H. Kawaguchi, T. Hirayama, L.E.G. Johansson, and K. Okabe, Tech. Dig. Int. Symp., VLSI Tech., 66 (1992).
15. T. Mogami, H. Wakabayashi, Y. Saito, T. Tatsumi, T. Matsuki, and T. Kunio, IEEE Trans. Electron Dev. ED-43, 932 (1996).
16. Q. Xu and C. Hu, IEEE Trans. Electron Dev. ED-45, 2002 (1998).
17. P. Liu, T.C. Hsiao, and J.C.S. Woo, IEEE Trans. Electron Dev. ED-45, 1280 (1998).
18. P.D. Agnello, V.P. Kesan, M. Tejwani, and J.A. Ott, J. Electron. Mater. 23, 413 (1994).
19. P. Villars and L.D. Calvert, Pearsons' Handbook of Crystallographic Data for Intermetallic Phases (Metals Park, OH: American Society for Metals, 1986), pp. 2435 and 3194.
20. Joint Committee on Powder Diffraction Standards, No. 21-357, 1971.
21. K. Maex, Mater. Sci. Eng. R11, 53 (1993).
22. Z. Ma, Y. Xu, L.H. Allen, and S. Lee, J. Appl. Phys. 74, 2954 (1993).
23. O. Thomas, F.M. d'Heurle, S. Delage, and G. Scilla, Appl. Surface Sci. 38, 27 (1989).
24. D.B. Aldrich, C.L. Jahneke, R.J. Nemanich, and D.E. Sayers, Heteroepitaxy of Dissimilar Materials, vol. 221, ed. R.F.C. Farrow, J.P. Harbison, P.S. Peercy, and A. Zangwill (Pittsburgh, PA: MRS, 1991), p. 343.
25. S.P. Ashburn, M.C. Ozturk, J.J. Wortman, G. Harris, J. Honeycutt, and D.M. Mather, J. Electron Mater. 21, 81 (1992).
26. Z. Ma, L.H. Allen, and D.D.J. Allman, Thin Solid Films 253, 451 (1994).
27. H. Jeon, C.A. Sukow, J.W. Honeycutt, G.A. Rozgonyi, and R.J. Nemanich, J. Appl. Phys. 71, 4269 (1992).
28. Z. Ma and L.H. Allen, Phys. Rev. B 49, 13501 (1994).
29. D.B. Aldrich, F.M. d'Heurle, D.E. Sayers and R.J. Nemanich, Phys. Rev. B 53, 16279 (1996).
30. T.P. Nolan, R. Sinclair, and R. Beyers, J. Appl. Phys. 71, 720 (1992).
31. Z.G. Xiao and G.A. Rozgonyi, Mater. Res. Soc. Symp. Proc. 202, 101 (1991).