Structure and electrical property of platinum film biased dc-sputter-deposited on silicon

Applied Surface Science

Volumn 169, Issue 170, 2001, Pages 320-324

  Kojima, Daisuke ^a   Makihara, Kenji ^a   Shi, Ji ^a   Hashimoto, Mituru ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CONDUCTIVITY OF SOLIDS; METALLIC FILMS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SURFACE STRUCTURE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

INTERATOMIC DIFFUSION;

PLATINUM;

EID: 0035127772     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00662-0     Document Type: Article

References (8)

1. K. Sumi, et al., Thin Solid Films 315 (1998) 77.
2. Schmiedl R., Demuth V., Lahnor P., Godehardt H., Bodschwinna Y., Harder C., Hammer L., Strunk H.-P., Schulz M., Heinz K. Appl. Phys. A62:1996;223.
3. Qiu H., Safran G., Pecz B., Barna P.B., Kosuge A., Nakai H., Yugo S., Hashimoto M. Thin Solid Films. 229:1993;107.
4. Qiu H., Nakai H., Hashimoto M., Safran G., Adamik M., Barna P.B., Yagi E. J. Vac. Sci. Technol. A12(5):1994;2855.
5. C.C. Chen, Master Thesis, University of Electro-Communiations, Tokyo, 1997.
6. Qiu H., Hashimoto M., Barna A., Barna P.B. Thin Solid Films. 288:1996;171.
7. Qiu H., Ohbuchi T., Nakai H., Hashimoto M. Appl. Surf. Sci. 92:1996;47.
8. Ohbuchi T., Ishino M., Makihara K., Qiu H., Hashimoto M., Barna A., Barna P.B. Thin Solid Films. 312:1998;32.