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Applied Surface Science

Volumn 92, Issue , 1996, Pages 47-51

Structural and physical properties of Co films DC-bias-plasma-sputter-deposited on MgO(001)

(4) Qiu, Hong a Ohbuchi, Tatsuya a Nakai, Hisashi a Hashimoto, Mituru a

a UNIVERSITY OF ELECTRO COMMUNICATIONS (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COBALT; ELECTRIC RESISTANCE; MAGNESIA; MAGNETIZATION; PHYSICAL PROPERTIES; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DC BIAS VOLTAGE; PLASMA SPUTTER DEPOSITION; SATURATION MAGNETIZATION; TEMPERATURE COEFFICIENT ELECTRICAL RESISTANCE; X RAY PHOTON SPECTROSCOPY;

METALLIC FILMS;

EID: 0030562188 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00200-6 Document Type: Article

Times cited : (6)

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