Structural and electrical properties of Ni-Co films dc-biased plasma-sputter-deposited on MgO(001)

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 32-36

  Ohbuchi, Tatsuya ^a   Ishino, Masaki ^a   Makihara, Kenji ^a   Qiu, Hong ^a   Hashimoto, Mituru ^a   Barna, Arpad ^b   Barna, Peter B ^b  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Epitaxy; Interfaces; Sputtering; Transmission electron microscopy (TEM)

Indexed keywords

COBALT; CRYSTAL LATTICES; DISLOCATIONS (CRYSTALS); ELECTRIC RESISTANCE; EPITAXIAL GROWTH; IMPURITIES; MAGNESIA; NICKEL ALLOYS; SPUTTER DEPOSITION; STRAIN; SUBSTRATES;

PLASMA SPUTTER DEPOSITION; STRAIN ENERGY; TEMPERATURE COEFFICIENT OF ELECTRICAL RESISTANCE;

METALLIC SUPERLATTICES;

EID: 0031679673     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00274-5     Document Type: Article

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