Progress in x-ray mask technology at NTT

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3402-3406

  Oda, Masatoshi ^a   Shimada, Masaru ^a   Tsuchizawa, Tai ^a   Uchiyama, Shingo ^a   Okada, Ikuo ^b   Yoshihara, Hideo ^b  

^a NTT CORPORATION   (Japan)

^b NIT Advanced Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033267362     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591019     Document Type: Article

References (7)

1. M. Yamabe, Proc. SPIE 4312, 88 (1998).
2. J. Nakamura, K. Deguchi, Y. Kawai, K. Nakanishi, and M. Oda, Digest of Papers XEL '98 (Yokohama) (1998), pp. M5-2-1.
3. H. Nishimura, T. Ono, M. Oda, and S. Matsuo, J. Vac. Sci. Technol. A 15, 707 (1997).
4. T. Morosawa et al., Digest of Papers XEL '98 (Yokohama) (1998), pp. M6-3-1.
5. I. Okada, K. Nakanishi, and M. Oda, Digest of Papers Photomask Japan '99 (1999), pp. 131.
6. M. Oda, S. Uchiyama, T. Watanabe, K. Komatsu, and T. Matsuda, J. Vac. Sci. Technol. B 14, 4366 (1996).
7. M. Oda, M. Sakatani, S. Uchiyama, and T. Matsuda, Proc. SPIE 3096, 245 (1997).