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Applied Physics A: Materials Science and Processing

Volumn 73, Issue 1, 2001, Pages 97-101

Core-level and valence-band characteristics of carbon nitride films with high nitrogen content

(6) Zhao, J P a Chen, Z Y a Yano, T a Ooie, T a Yoneda, M a Sakakibara, J a

a AIST Shikoku (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; BINDING ENERGY; CARBON NITRIDE; HIGH PRESSURE EFFECTS; PULSED LASER DEPOSITION; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE PULSED-LASER DEPOSITION;

THIN FILMS;

EID: 0034969337 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390000620 Document Type: Article

Times cited : (8)

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