Mask definition by nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4349, Issue , 2001, Pages 82-85

  Lyebyedyev, D ^a   Scheer, H C ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; NANOTECHNOLOGY; OPTIMIZATION; PLASMA ETCHING; POLYSTYRENES; REACTIVE ION ETCHING;

NANOIMPRINT LITHOGRAPHY;

MASKS;

EID: 0034929669     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425079     Document Type: Conference Paper

References (10)

1. Imprint of sub-25 nm vias and trenches in polymers
2. Hot embossing in polymers as a direct way to pattern resist
3. Problems of the nanoimprinting technique for nanometer scale pattern definition
4. Polymer issues in nanoimprinting technique
5. New polymer materials for nanoimprinting
6. Mask fabrication by nanoimprint lithography using antisticking layers
7. Magnetically enhanced reactive ion etching (MERIE) with different field configurations
8. Oxygen plasma etching for resist stripping and multilayer lithography
9. Bilayer resist used in e-beam lithography for deep narrow structures
10. Oxygen reactive ion etching of polymers - Profile evolution and process mechanisms